The following companies participated in the construction work under the supervision of VARIOPLAN-Switzerland:

•    Meissner und Wurst GmbH : Heating, Cooling, Airconditioning Units.
•    Siemens : Electrical Installation
•    Hager Elsasser GmbH : DI Water and Neutralization Systems.
•    Laflow GmbH : Laminar Flow Hoods and Wet Benches
•    Ritterwand : Ceiling and Walls
•    P.K. Müller GmbH : Gas Distribution Systems
•   Arthur Haller : Antistatic, Conductive Floors

• Main Area
• THERMCO Four-Stack Diffusion Furnace Systems :
• Nine (9), Model 4104 Four-Stack Diffusion Furnaces
• Nine (9), Model 4100 Load Stations
• Twenty-Four (24), Model A-2 Boat Loaders
• Nine (9), Model 4100 Gas Source Cabinets with Eight (8) Type Gas Systems
• Thirty-Six (36), Model 8016 Programmers

• Four (4), Wet Benches (LAFLOW)
• Three (3), Rinser/Dryers (HEREAUS)
• One (1), Nanospec/AFT Computerized Film Thickness Measurement System NANOMETRICS INC.)
• One(1), Model M-700 Four Point Probe System (MAGNETRON INS.)
• One (1), Inspection Microscope (NIKON)
• B/L Preparation Room
• One (1), Model 703 Scrubber (MTI)
• One (1), Model EC101D Series Photoresist Spinner (HEADWAY RESEARCH INC.)
• One (1), Model 3490 M-1 Oven (LAB-LINE INSTRUMENTS INC.)
• Chemical Room For Cleaning Quartzware And Metal Pieces
• Three (3), Wet Benches (FELL GROUP)

• Two (2), AMV-1200 Dual Vertical Epitaxial Reactor Systems (APPLIED MATERIALS) together with 50 KW RF GENERATORS (WESTINGHOUSE) and ES-500 Effluent Gas Scrubbers (APPLIED MATERIALS)
• One (1), Model 1430 Ratio Recording Infrared Spectrophotometer (PERKIN-ELMER)
• One (1), Model M-700 Four Point Probe System (MAGNE- TRON INSTRUMENTS)
• One (1), Model 80 Series Digital Infrared Thermometer (MICRON INSTRUMENTS COMPANY INC.)
• TWO (2), Model PM 80 Wafer Spin Cleaners (HEADWAY RESEARCH INC.)
• One (1), Wet-Bench (LAFLOW)
• One (1), Rinser/Dryer (HEREAUS)
• One (1), Stroboscope (COLE-PARMER)
• One (1), Inspection Microscope (NIKON)

• Yellow Room
• Three (3), Model 702 Photoresist Coater Systems (MTI)
• Three (3), Model 703 Photoresist Developer Systems (MTI)
• Two (2), Model CA-800 Cobilt Manual Mask Aligners (APPLIED MATERIALS)
• One (1), Model CA-800 Cobilt Mask Aligner with AL-550 Automatic Wafer Loading Option (APPLIED MATERIALS)
• Two (2), Model 3490 M-1 Ovens (LAB-LINE INS.INC.)
• Two (2), Inspection Microscopes (NIKON)

• Red Room
• One (1), Model 142 Contact Printer (TAMARACK SCIENTIFIC CO.INC.)
• One (1), Photomask Process Station (DEXON)
• One (1), Rinser/Dryer (HEREAUS)
• Two (2), Mask Plate Inspection Microscopes (NIKON)

• Five (5), Wet-Benches (LAFLOW)
• Four (4), Rinser/Dryers (HEREAUS)
• Two (2), Model 3005-1813 SCA Automatic Plasma Systems with PM 119 RF Generators (IPC-BRANSON)
• One (1), Model 2015 Sectioner (PHILTEC)
• One (1), Model 3490 M-1 Oven (LAB-LINE INS.INC.)
• Two (2), Inspection Microscopes (NIKON)

• One (1), Model 3119 R&D Single Crucible-10 KW e-GUN Source System (VARIAN)
• Two (2), Model 3119 R&D 5KVA Filament Source Coater Systems (VARIAN)
• One (1), Wet-Bench (LAFLOW)
• One (1), Rinser/Dryer (HEREAUS)
• One (1), Model 216 CVD Reactor (G.S TEMPRESS B.V.)

• One (1), Model SNG-32BAW 2088 Back Lapping Machine (SPEEDFAM CORP.)
• One (1), Wafer Mount/Dismount Station for Back-Lap Process. (SPEEDFAM CORP.)